@inproceedings{Kerber-et-al_SMI08,
TITLE = {Feature Sensitive Bas Relief Generation},
AUTHOR = {Kerber, Jens and Tevs, Art and Zayer, Rhaleb and Belyaev, Alexander and Seidel, Hans-Peter},
LANGUAGE = {eng},
ISBN = {978-1-4244-4068-9},
URL = {http://www.mpi-inf.mpg.de/~kerber/publications/Jens_Kerber_SMI_2009.pdf},
DOI = {10.1109/SMI.2009.5170176},
LOCALID = {Local-ID: C125675300671F7B-8F2AFB7CFC9176DFC12575F6003BAF29-Kerber_SMI2009},
PUBLISHER = {IEEE Computer Society Press},
YEAR = {2009},
DATE = {2009},
ABSTRACT = {Among all forms of sculpture, bas-relief is arguably the closest to painting. <br>Although inherently a two dimensional sculpture, a bas-relief suggests a visual <br>spatial extension of the scene in depth through the combination of composition, <br>perspective, and shading. Most recently, there have been significant results on <br>digital bas-relief generation but many of the existing techniques may wash out <br>high level surface detail during the compression process. The primary goal of <br>this work is to address the problem of fine features by tailoring a filtering <br>technique that achieves good compression without compromising the quality of <br>surface details. As a secondary application we explore the generation of <br>artistic relief which mimic cubism in painting and we show how it could be used <br>for generating Picasso like portraits.},
BOOKTITLE = {IEEE International Conference on Shape Modeling and Applications Proceedings},
EDITOR = {Yong, Jun-Hai and Spagnuolo, Michela and Wang, Wenping},
PAGES = {148--154},
ADDRESS = {Beijing, China},
}